As critical dimensions shrink and device complexity increases, the quality of your data is critical for the success of your research, analysis, and ultimately device yield. The key to quality results is accuracy at the nanoscale. Park NX20, the world’s most accurate AFM for FA and QA, is the only high-end, large-sample AFM with non-contact mode for preserving tip sharpness. Park NX20 provides the highest accuracy and repeatability for roughness measurements and defect review. Park NX20 offers the highest productivity and the industry’s lowest AFM lifecycle costs by dramatically lowering tip costs by extending tip lifetime. The result is a total AFM solution for FA and QA that meets accuracy, productivity and budgetary needs.

Accurate AFM Solutions for FA and QA Laboratories
• Surface roughness measurements for media and substrates
• Defect review imaging and analysis
• High resolution electrical scan mode
• Sidewall measurements for 3D structure study

Accurate and Repeatable Measurements for Better Productivity
• Preserving the sharpness of the tip end for surface roughness accuracy
• Fastest defect imaging in non-contact mode
• Unique decoupled XY scanning system for 3D structure measurements
• Minimized system drift and hysteresis using thermally matched components

Accurate AFM Topography by Low Noise Z Detector
• Sample topography measured by industry leading low noise Z detector
• True Sample Topography^TM without edge overshoot or piezo creep error
• Accurate surface height recording even during high-speed scanning
• Industry leading forward and backward scan gap of less than 0.15%

Tip Cost Saving by True Non-Contact Mode^TM
• 10 times or longer tip life for general purpose and defect imaging
• Less tip wear for prolonged high-quality scans
• Minimized sample damage or modification