Near-field Scanning Optical Microscopy built on Artifact-Free Imaging XE Platform

Built on the award-winning XE-100 AFM platform, the XE-NSOM is designed to provide the most stable measurement conditions for both topography and NSOM measurements. Its dedicated optical modules, allowing access to the top, side, and bottom of the sample, facilitate a variety of NSOM configurations including transmission and reflection mode. With the precise feedback control of the XE AFM platform, the XE-NSOM sets a new standard for accurate observation of near-field optical phenomena.

Artifact-Free Imaging by Crosstalk Elimination
• Two independent, closed-loop XY and Z flexure scanners for sample and tip
• Out-of-plane motion of less than 2 nm over entire scan range
• Flat and linear XY scan of up to 100 µm × 100 µm with low residual bow
• Up to 25 µm Z-scan by high force scanner
• Accurate height measurement

Dedicated Optical Modules for Various NSOM Modes and Experiments
• Supports transmission and reflection modes
• Open access for optical coupling such as fluorescence and Raman spectroscopy for TERS
• Three dedicated optical modules for top, side, and bottom access
• Compatible with aperture/apertureless NSOM
• Integrated with inverted optical microscopes for advanced optical measurements
• Digital outputs for synchronization with external devices

Ultimate AFM Resolution by True Non-Contact Mode
• 10 times larger Z-scan bandwidth than a piezotube
• Less tip wear for prolonged high-quality and high resolution imaging
• Minimized sample damage or modification
• Immunity from parameter-dependent results observed in tapping mode