SThM acquires the local thermal conductivity of a sample by measuring heat transfer between tip and sample using a micro-fabricated probe.

  • Operational modes: Conductivity Contrast Microscopy, Thermal Contrast Microscopy
  • Tip radius and device material of the probe: 100 nm, NiCr & Pd
  • Thermal spatial resolution: < 100 nm
  • Allowable current limit: 1 mA
  • Operating temperature: up to 160 °C
  • Temperature resolution: 0.1 °C
  • Noise level in temperature: 0.05 °C


For further information on this Mode, please click here.

In TERS, Raman spectrum is enhanced when a sharp tip coated with gold approaches an illuminated sample surface. Using an AFM cantilever as the enhancer, nano-scale chemical properties are measured by an integrated Raman spectrometer while the topographic data is acquired simultaneously by AFM.

For further information on this mode, please click here.

The XE Optical Head provides wide optical accessibility from side and is compatible with all the options of the XE-series. When combined with Raman spectroscopy, the AFM cantilever can be used as a medium of light amplification. The optical head insures large side clearance and sample access for users to take advantage of the enhanced optical response of the sample.

 • Optical accessibility: top and side
 • Z scan range: 12 µm or 25 µm
 • Resonant frequency: 3 kHz (12 µm XE Head), 1.7 kHz (25 µm XE Head)
 • Laser type: LD (650 nm) or SLD (830 nm)
 • Noise floor: 0.03 nm (typical), 0.05 nm (maximum)

FMM measures mechanical property variations over a sample surface. While in contact with the sample surface, an AC modulation is applied to the cantilever. By monitoring changes in the amplitude and phase lag between the driving signal and cantilever oscillation, qualitative elastic and viscous responses can be derived.

  • Adjustable modulation frequency: 1 kHz - 600 kHz
  • Frequency resolution: 0.02 Hz
  • Amplitude detection: < 0.1 nm
  • Phase resolution: 0.005°


For further information on this Mode, please click here.

By using the cantilever to indent the sample with excessive force, the mechanical properties of the sample can be measured. Hardness and elasticity are acquired by analyzing the loading and unloading curves of indentation.

  • Batch measurement on user specified points or grid
  • Indenting travel range: 12 µm
  • Displacement resolution: 0.1nm
  • Load Application: Piezoelectric Actuator
  • Loading Capability:
    - Maximum Load: 100 nN ~ 100 µN
    - Load Resolution: 100 nN


For further information on this Mode, please click here.

Nanolithography provides the ability to manipulate and/or create patterning on the sample surface through applied force or voltage. Tip positioning for lithography can be controlled by importing vector drawings or raster (bitmap) images.

  • Lithography method: vector and/or raster scan
  • Bias range: -10 V - +10 V
  • Bias noise: 20 μV
  • High Voltage Toolkit required for voltages over ¡¾10V

For further information on this Mode, please click here.

MFM measures the magnetic variations over a sample surface by detecting the interaction between a magnetized cantilever and sample surface. The cantilever measures surface topography on the first scan, then lifts and follows either the stored surface topography (lift mode, available only in selected countries) or a constant distance (or constant height) at a fixed height above the sample surface.

  • Lateral resolution: 20 nm (depending on the tip size of the cantilever used)
  • Phase resolution: 0.01°


For further information on this Mode, please click here.

TM-MFM measures the magnetic domain distribution with respect to a magnetic field change.

 • Magnetic field generator is required
 • Adjustable magnetic field of -300 gauss ~ +300 gauss
 • Field resolution: 3 gauss

For further information on this Mode, please click here.

The magnetic field generator is used for applying an external magnetic field to a sample. The applicable field can be changed from -300 gauss to 300 gauss, and is parallel to the sample surface. The change in magnetic structure by the varying field can be observed by magnetic force microscopy (MFM).

 • External field applied parallel to sample surface
 • Magnetic field resolution of 3 gauss
 • Composed of pure iron core and two solenoid cells
 • Range: -300 - 300 gauss

The live cell chamber creates an ideal environment for cells, improving the life expectance during long measurement durations. The chamber controls temperature, humidity, and pH.

 • Temperature control: RT - 60 °C (0.1 °C stability)
 • Incorporated with gas mixer and humidity controller

For further information on this Mode, please click here.

For the detailed product information, please click Conductive AFM tab above.

SCM can provide doping concentration information over the sample surface by measuring the capacitance change between tip and sample. The capacitance change is acquired by monitoring the change in the resonance frequency of a cavity resonator. The sensitivity of the measurement depends on the selection of the optimal frequency of the resonator. Park Systems’ SCM module enables a variable resonator frequency, which allows a wide RF bandwidth capable of monitoring a large range of doping concentrations by selecting the most sensitive frequency of the resonator for a specific doping range.

  • Frequency range: 850 MHz - 1050 MHz, selectable by software in ~0.1 MHz resolution
  • Frequency resolution: 2 kHz
  • Capacitance sensitivity: < 1 aF
  • SCM Phase resolution: 0.005°

For further information on this Mode, please click here

SSRM measures the local resistance over a sample surface. It is an extension of the well-established method of Spreading Resistance Profiling (SRP) used for micro and nano-scale measurements. Identical to Conductive AFM operation, in SSRM a conductive AFM tip scans a small device region while applying a DC bias.

  • Bias range: -10 V - +10 V
  • Carrier concentration: 10¹⁵ - 10²⁰ /cm³
  • Lateral resolution: 10 nm


For further information on this Mode, please click here.

STM measures the tunneling current between tip and sample. The constant current mode with height feedback reflects the topography of the sample surface. The current measurement options of the XE-series enable acquiring sub-nanometer scale STM images.


For further information on this Mode, please click here.

The STS option enables acquisition of current-voltage (I/V) spectroscopy at user-defined points. Spectroscopy data can be used to analyze the local electronic states of the sample.

  • Batch measurement on user defined points (max.128 x 128 points)
  • Applicable bias range: -10 V to 10 V
  • Current resolution: < 0.1 pA (ULCA option)

For further information on this mode, please click here.

Tr-PCM measures photoelectric response to a time-resolved illumination without interference from unwanted light sources including the feedback laser. It includes a laser illumination module and acquisition and analysis software.

 • Electric current resolution: 0.03 nA
 • Acquisition time resolution: 20 µsec
 • Automatic analysis of life-time from photocurrent curves


For further information on this Mode, please click here.

The force-distance interaction between the cantilever and the sample is detected by monitoring the deflection of the cantilever as it approaches and retracts from the sample. The mechanical properties of the sample are then analyzed from the force-distance spectroscopy data.

  • Batch measurement on user specified points
  • Force volume image: maximum 128 × 128
  • Force resolution: < 10 pN


For further information on this Mode, please click here

Force volume imaging can provide a map of the sample’s material properties by plotting parameters such as stiffness, cantilever snap-in, and adhesion. Parameters extracted from Force Distance (F-D) spectroscopy curves are taken in matrix spacing.

 • Up to 256 × 256 points
 • Automatic calculation of various F-D parameters (stiffness, snap-in, adhesion)
 • Analysis software includes batch analysis and export

For further information on this Mode, please click here.

To measure accurate force data, the calibration of the cantilever is indispensable. Park Systems offers the spring constant calibration option by thermal method using optional data acquisition board with a sampling rate of ~ 1.2 MHz

  • Automatic detection of the spring constant
  • Automatic/manual cantilever deflection sensitivity calibration


For further information on this Mode, please click here

Four different EFM modes are provided by the XE-series Enhanced EFM: Standard EFM, Dynamic-Contact EFM (DC-EFM), Piezoelectric Force Microscopy (PFM), and Scanning Kelvin Probe Microscopy (SKPM). The movement of a cantilever is influenced by electric force between cantilever and sample; cantilever displacement can be analyzed as potential, charge, or electric domains.

  • Bias range: - 10 V - +10 V


For further information on this Mode, please click here

DC-EFM is an EFM mode capable of high definition EFM results. Patented by Park Systems*, DC-EFM actively applies an AC voltage bias to the cantilever and detects the amplitude and the phase change of the cantilever modulation with respect to the applied bias. DC-EFM provides the ability to monitor the second harmonic of the modulation which can be related to the capacitance of a sample and enhances the electric force signal from the background inter-molecular force.

  • Bias range: -10 V - +10 V
  • AC bias frequency: 0 - 100 kHz (1 Hz frequency resolution)

*US Patent No : 6185991


For further information on this Mode, please click here

PFM can measure electric domain structures such as polarity in ferroelectric or piezoelectric materials. Patented by Park Systems*, PFM monitors electrostriction or “inversed piezoelectric” effects of an applied bias by measurement of cantilever deflection. Information about the local piezoelectric coefficient and its polarity is directly related to the amount of expansion or contraction of the electric domains in a sample. PFM includes independent control of an applied AC and/or DC bias, as well as, local amplitude/phase vs. DC bias spectroscopy (see Piezoelectric Response Spectroscopy).

  • AC bias frequency: 0 - 100 kHz
  • Phase resolution: 0.005°
  • DC Bias: - 10 - +10 V (-2kv - +2kV, optional)

*US Patent No : 6185991


For further information on this Mode, please click here

Piezoelectric Response Spectroscopy is a spectroscopy mode capable of measuring the local amplitude/phase response to a DC bias between tip and sample surface. The polarity of local piezoelectric domain switches depend on the sign and amount of applied voltage.

 • External high voltage kit required
 • DC Bias: -2kV ~ +2kV

For further information on this mode, please click here

The external high voltage kit provides an applied external bias option up to 2 kV.

 • Bias range: up to 2 kV
 • Works with Conductive AFM, EFM/SKPM/DC-EFM/PFM, and Nanolithography

ULCA provides ultra-high current sensitivity, detecting current signals as small as 0.1 pA. To minimize external noise, the amplification circuit is simplified with a fixed gain.

• Bias range: -10 V - 10 V
• Maximum current: 100 pA
• Current noise: < 0.1 pA
• Cut-off frequency: 200 Hz

For further information on this Mode, please click here

By taking advantage of a variable gain control, VECA enables the user to study a wide range of current inputs and sample conductivities. The allowable current is as high as 10 mA with minimal current noise.

• Bias range: -10 V - 10 V
• Maximum current: 1 pA - 10 mA
• Current noise: < 0.3 pA (gain: 10⁹ V/A)
• Cut-off frequency: 1.2 kHz (gain: 10⁹ V/A)

For further information on this Mode, please click here

Internal Conductive AFM provides current detection using an internal current amplifier. The maximum voltage range is +/- 10V which can be applied at the tip or sample.

• Bias range : -10 V - 10 V
• Maximum current: 10 pA - 10 µA
• Current noise: < 1 pA
• Cut-off frequency: 3 kHz

For further information on this Mode, please click here

Conductive AFM techniques facilitate current-voltage (I-V) spectroscopy on specified points of a sample surface. The low noise of Park Systems¡¯ conductive AFM options permits the detection of minute changes in a sample¡¯s electronic characteristics.

  • Batch measurement of user specified points (max.128 x 128 points)
  • Applicable bias range: -10 V - 10 V
  • Current resolution: < 0.1 pA (ULCA option)


For further information on this Mode, please click here

In True Non-Contact mode, a piezoelectric modulator vibrates a cantilever at a small amplitude and fixed frequency near the intrinsic resonance of the cantilever. As the tip is brought closer to the sample, the van der Waals attractive force between tip and sample influences the amplitude and phase of the cantilever’s vibration. These amplitude and phase changes are monitored by the patented Z-servo feedback system of the XE-series AFM, which maintains a tip-surface distance of just a few nanometers without damaging the sample surface. Precise control of the tip-sample distance, facilitated by the fast feedback performance of Park Systems’ high force Z-scanner, allows for imaging of the fine structure of a sample.

  • Tip-sample distance : 3 nm (typical)
  • Cantilever oscillation frequency: 1 - 600 kHz
  • Cantilever oscillation amplitude: 1 - 2 nm (typical)


For further information on this Mode, please click here.

All the AC modulation techniques, such as True Non-Contact, MFM, EFM, and SCM, produce phase data. XE’s electronics, combined with True Non-Contact mode, enable contrast phase data which is isolated from the topographic crosstalk.

  • Phase resolution: 0.005°


For further information on this Mode, please click here.

Along with deflecting in the vertical direction, the cantilever may experience lateral deflection when engaged with a sample. The lateral movement results mainly from lateral friction, and is recorded as a lateral force microscopy image.


For further information on this Mode, please click here.

In this basic AFM mode of operation, the cantilever is in contact with the surface while imaging. The deflection of the cantilever is used for feedback and recorded as topographic data.

  • Tip-sample distance control: Contact


For further information on this Mode, please click here