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  • Park
    NX10
    AFM Specifications

Park NX10 Specifications

XY Scanner

Single module flexure XY-scanner with closed-loop control
50 µm × 50 µm (optional 10 µm × 10 µm or 100 µm × 100 µm)
Resolution : 0.05 nm
Position detector noise : < 0.25 nm (bandwidth: 1 kHz)
Out-of-plane motion : < 2 nm (over 40 µm scan)

 

Motorized Stage

Sample size : up to 50 mm x 50 mm, up to 20 mm thickness
Sample weight : up to 500 g
XY stage travel : 20 mm x 20 mm
Z stage travel : 22 mm
Focus stage travel : 15 mm

 

Z Scanner range

Guided high-force flexure scanner
Scan range : 15 µm (optional 30 µm)
Resolution : 0.015 nm
Position detector noise : 0.03 nm (bandwidth: 1 kHz)
Resonant frequency : > 9 kHz (typically 10.5 kHz)

 

Vision


10x (0.21NA) ultra-long working distance lens (1µm resolution)
20x (0.42 NA) high-resolution, long working distance lens (0.6 µm resolution)
Direct on-axis vision of sample surface and cantilever
Field-of-view : 480 × 360 µm (with 10× objective lens)
CCD : 1 Mpixel (pixel resolution: 0.4 µm)

 

Software

SmartScan™

Dedicated system control and data acquisition software
Adjusting feedback parameters in real time
Script-level control through external programs(optional)

XEI

AFM data analysis software

 

Electronics

Signal processing

ADC : 18 channels
4 high-speed ADC channels (64 MSPS)
24-bit ADCs for X, Y, and Z scanner position sensor
DAC : 12 channels
2 high-speed DAC channels (64 MSPS)
20-bit DACs for X, Y, and Z scanner positioning
Maximum data size : 4096 x 4096 pixels

Integrated functions

3 channels of flexible digital lock-in amplifier
Spring constant calibration (Thermal method, optional)
Digital Q control

External signal access

20 embedded signal input/output ports
5 TTL outputs : EOF, EOL, EOP, Modulation, and AC bias

 

AFM Modes
(*Optionally available)

Standard Imaging

True Non-Contact AFM
PinPoint™ AFM
Basic Contact AFM
Lateral Force Microscopy (LFM)
Phase Imaging
Intermittent (tapping) AFM

Force Measurement*

Force Distance (FD) Spectroscopy
Force Volume Imaging

Dielectric/Piezoelectric Properties*

Electric Force Microscopy (EFM)
Dynamic Contact EFM (EFM-DC)
Piezoelectric Force Microscopy (PFM)
PFM with High Voltage

Mechanical Properties*

Force Modulation Microscopy (FMM)
Nanoindentation
Nanolithography
Nanolithography with High Voltage
Nanomanipulation
Piezoelectric Force Microscopy (PFM)

Magnetic Properties*

Magnetic Force Microscopy (MFM)
Tunable MFM

Optical Properties*

Tip-Enhanced Raman Spectroscopy (TERS)
Time-Resolved Photo Current Mapping (PCM)

Electrical Properties*

Conductive AFM
IV Spectroscopy
Scanning Kelvin Probe Microscopy (SKPM/KPM)
SKPM with High Voltage
Scanning Capacitance Microscopy (SCM)
Scanning Spreading-Resistance Microscopy (SSRM)
Scanning Tunneling Microscopy (STM)
Scanning Tunneling Spectroscopy (STS)
Time-Resolved Photo Current Mapping (PCM)

Chemical Properties*

Chemical Force Microscopy with Functionalized Tip
Electrochemical Microscopy (EC-STM and EC-AFM)

 

AFM Options

Temperature Control

Heating & Cooling Stage (0~180 ºC)
250 ºC Heating Stage
600 ºC Heating Stage

Liquid Cells

Universal Liquid Cell
Electrochemistry Cell
Open Liquid Cell

Liquid Probehand

Designed for imaging in general liquid environment
Resistant to most buffer solutions including acid
Contact and Non-contact AFM imaging in liquid

Clip-type Chip Carrier

Can be used with unmounted cantilever
Tip bias function available for Conductive AFM and EFM
Tip bias range : -10 V ~ 10 V

Magnetic Field Generator

Applies external magnetic field parallel to sample surface
Tunable magnetic field
Range : -300 ~ 300 gauss
Composed of pure iron core & two solenoid coils

 

Dimensions in mm

nx10 sys demensionnx10 ae demension

Park NX10 - Specifications | Park Atomic Force Microscope