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"Three-Dimensional Imaging of Undercut and Sidewall Structures by Atomic Force Microscopy," authored by researchers at Park Systems and published in Review of Scientific Instruments (Volume 82, Number 2), has been selected for the March 7, 2011 issue of Virtual Journal of Nanoscale Science & Technology. The Virtual Journal, which is published by the American Institute of Physics and the American Physical Society in cooperation with numerous other societies and publishers, is an edited compilation of links to articles from participating publishers, covering a focused area of frontier research.

 

The paper reports the latest progress from Park Systems' technology development in new 3D AFM with high resolution undercut and sidewall imaging capability. In overcoming the limitation of previous 3D AFM approaches by a flared tip, the probes used on the new 3D-AFM maintain the high aspect ratio and sharp tip radius, typically less than 10 nm, providing the accurate metrology of critical dimension along with sidewall roughness for the first time. Combined with non-contact AFM imaging by its patented high bandwidth Z-scanner, Park Systems' XE-3DM technology offers non-destructive characterization of soft sample surface such as photoresist.


"The new 3D-AFM can perform high resolution sidewall imaging of photoresist structures with unprecedented accuracy and repeatability. It is a unique and powerful litho-metrology solution to characterize the key process matrix such as line edge roughness (LER). XE-3DM is the only tool on the market today providing high resolution in-line, non-destructive 3D information to our industrial customers," said Ryan (YK) Yoo, Vice President of Global Sales and Marketing. Since its inception, Park Systems has established itself as an innovator and technology leader of the atomic force microscope and the company continues to expand its AFM product offerings by licensing and supporting its technology with partners, to bring cutting-edge AFM solutions to market.

(Click here to see the RSI paper)

 


About XE-3DM 

The XE-3DM, the fully automated AFM system, is designed for overhang and trench profiles, sidewall roughness and imaging, and critical angle measurements. The unique design of the XE-3DM, made possible by the XE-series' decoupled XY and Z scanning system, allows for characterization of undercut features as well as top surfaces. In addition, combined with Park Systems' True Non-Contact mode, the XE-3DM can realize non-destructive imaging of soft photoresist structures without deforming or damaging them. Further information on the XE-3DM, please click here.
 

About Park Systems

Park Systems serves its customers by providing a complete range of AFM solutions including AFM systems, options and software, along with global service and support. For over 25 years, Park Systems has developed a reputation as the AFM technology leaderand the preferred nanotechnology solutions partner among major universities, research institutes and industry leaders who demand the most precise metrology for the most challenging problems in their fields. Park Systems promotes sustainable, long-term growth of its AFM business by constantly seeking to address the changing needs of AFM users. Park Systems' manufacturing and engineering facilities are located in Suwon, South Korea. Global sales and service offices are located throughout the U.S., Japan, and Singapore. For more information, visit www.parkAFM.com.

Source: Park Systems Corp. 
Park Systems 
Tim Ahn, +82-546-6800 x6926 
Marketing Communication

 

Linkhttp://www.nature.com/nature/journal/v469/n7331/full/nature09697.html

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