Closed-loop XY scan with dual servo achieves the unprecedented accuracy and orthogonality in AFM scans
Santa Clara, California, USA, December 3, 2012
Park Systems announces today the release of a closed-loop XY scanner with a Dual Servo system. This innovation loosely decouples the X and Y scanners to eliminate crosstalk and adds a symmetrical, low-noise position sensor on each axis to produce the most accurate and orthogonal (independent) atomic force microscopy in the industry.
Dr. Sang-il Park, the founder and CEO of Park Systems describes the new system this way, “In its Crosstalk Elimination technology, Park AFM utilizes two independent flexure scanners, one for the sample and one for the probe. This introduces a highly beneficial decoupling of the XY and Z movements in an AFM scan. Now, with Duo Servo technology, the flexure XY scanner separates the X and Y scan motion while retaining a small coupling between their movements to accommodate accurate scans as the sample gets bigger and the scan area increases. In the Dual Servo system, a symmetrical, low-noise position sensor, incorporated on each axis of the XY scanner, corrects and compensates for non-linear and non-planar positional errors.”
The X and Y position sensors work in a sophisticated self-correcting closed-loop system with a separate Z position sensor. This is the key technological advance of the new Park NX10 and Park NX20 atomic force microscope systems. The new X and Y position sensors dramatically reduce the forward and backward scan gap over a wide bandwidth, which they maintain at less than 0.15%, the best in the industry. The Dual Servo system provides linear and orthogonal feedback control for the highest accuracy and most precise scan for any scan area or sample size.
About Park Systems
Park Systems serves its customers by providing a complete range of AFM solutions including AFM systems, options and software, along with global service and support. Park Systems is the leading nanotechnology solutions partner for nanoscale measurements and systems for both research and industry. The product line of Park Systems reflects its focused strength to help customers achieve the metrology performance that meets the needs and requirements of present and future applications. Since improvements in nanometrology are key to enabling tomorrow's research, analysis, processing and product manufacturing, the innovative technology and market leadership of Park Systems in the field of nanometrology will remain as the core competence and market driving force of its future business. Park Systems' manufacturing and engineering facilities are located in Suwon, South Korea. Global sales and service offices are located throughout the U.S., Japan, and Singapore. For more information, visit www.parkAFM.com.