Welcome to Park Systems' Q2, 2010 Newsletter
Piezoelectric Force Microscopy (PFM)
In Piezoelectric Force Microscopy (PFM) of ferroelectric or piezoelectric materials, a conductive AFM tip is brought into contact with the surface while applying a pre-set voltage between the tip and sample. An electric field is established within the samples. Due to electrostriction or "inversed piezoelectric" effect of the material, the sample locally expands or contracts according to the electric field. The amount of cantilever deflection change is directly related to the amount of expansion or contraction of the sample electric domains, and hence to the piezoelectric properties of the sample.
New XE-100 Plus
Park Systems, the AFM technology leader and preferred nanotechnology solutions partner for demanding nanoscale research and industrial measurements, introduces the new XE-100 Plus with reduced drift rate and theStep-and-Scan Automation. The XE-100 Plus provides significant advantages over the previous generations of XE-100 while maintaining the ultimate AFM/SPM performance in True Non-Contact nanoscale metrology. It is a mid-priced system for materials science, polymers, electrochemistry and other applications in nanoscience and engineering. It can adopt a wide range of optical couplings with its open side access. Click here for the detailed product information.
Park Systems and the Institute for Molecules and Materials at Radboud University are co-organizing a workshop on Ion Conductance Microscopy to be held at Radboud University, Netherlands, June 24th, 2010.(Clickhere for the full information leaflet.)This workshop of invited and contributed talks will cover recent advances in live cell measurements using Ion Conductance Microscopy (ICM) techniques, as well as state of the art SPM studies of biological systems. The meeting will include an XE-Bio and ICM imaging demonstration.Click here for the rest of the event article.
Park Systems Opens European Applications Center in Langen, Germany
Suwon, South Korea, May 10, 2010 - Park Systems, the AFM technology leader and preferred nanotechnology solutions partner for demanding nanoscale research and industrial measurements, will open a European Applications Center at the Schaefer GmbH office located at Robert-Bosch-Strasse 31, D-63225 Langen, Germany, on May 10th, 2010. The facility will be staffed with scientists and engineers from Park Systems Corp and equipped with Park Systems' latest Atomic Force Microscope and advanced applications options.
LOT-Oriel Ltd, UK Has Been Appointed as Distributor for Park Systems
Suwon, South Korea, May 06, 2010 - Park Systems, the AFM technology leader and preferred nanotechnology solutions partner for both research and industry, and LOT-Oriel Ltd. UK, announced today that they have entered into a new distribution agreement that will enable Park Systems to extend its global reach and promote its products in the United Kingdom and Ireland. LOT Oriel UK is in the process of establishing a Park Systems demonstration laboratory at its office in Leatherhead, UK, and will launch its introduction of the Park Systems XE-series AFMs at the Microscience International Conference and Exhibition in London, UK (June 2010). Click here for the rest of the news article.
Park Systems, the AFM technology leader and preferred nanotechnology solutions partnerfor demanding nanoscale research and industrial measurements, will exhibit at the 2010 International Scanning Probe Microscopy (ISPM) Conference at the Keio Plaza Hotel, Sapporo, Japan on May 10th– 12th.The scientific program will be held at the Keio Plaza Hotel Sapporo.Park Systems will be featuring its wide range of AFM products at the ISPM. Please, visit our booth and find more about theXE-100 Plus, the award-winning research-grade AFM with Step-and-Scan Automation, the XE-150, the premier cross-functional AFM with motorized sample stage, and the XE-Bio, the new bio AFM for live cell imaging with Ion Conductance Microscopy (ICM).
E-MRS Meeting, June 8th ~ 10th, Strasbourg, France
Come and visit our booth(#048)at the E-MRS Meeting in Strasbourg, France from June 8th – 10th. Seethe new XE-100 Plus, the award winning research-grade AFM. The XE-100 provides artifact free imaging by Crosstalk Elimination (XE) and produces the ultimate AFM resolution by True Non-Contact mode. The new XE-100 Plus is equipped withStep-and-Scan Automation providing significant advantages over the previous generations of XE-100 while maintaining the ultimate AFM/SPM performance in True Non-Contact nanoscale metrology.
Images from Crosstalk Eliminated (XE) AFM