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Welcome to Park Systems’ Q2, 2011 Newsletter         tweeterfacebook

In this Issue: Featured Application Featured Product News and Events  Upcoming Exhibitions  Images from Crosstalk Eliminated (XE) AFM

Featured Application

High Resolution Sidewall Characterization

The unique design of the XE-3DM is made possible by deliberately and independently tilting the Z-scanner in its patented Crosstalk Eliminated (XE) AFM platform where XY and Z scanners are completely and independently decoupled. Unlike the flared tips, the probes maintain the high aspect ratio and sharp tip radius, typically less than 10nm, providing the accurate metrology of critical dimension along with sidewall roughness. The XE-3DM can measure critical dimensions efficiently and image the vertical sidewalls as well as undercut structures at deeper angles. The unprecedented high resolution of sidewall imaging opens the door to new characterization possibilities in measuring the sidewall roughness of nano-scale features, making it possible to enhance semiconductor and photonic device manufacturing.

Click here for further information on this application.

Featured Product

XE-3DM: Automated Industrial AFM for High-Resolution 3D Metrology

The XE-3DM, the fully automated AFM system, is designed for overhang and trench profiles, sidewall roughness and imaging, and critical angle measurements. The unique design of the XE-3DM, made possible by the XE-series' decoupled XY and Z scanning system, allows for characterization of undercut features as well as top surfaces. In addition, combined with Park Systems' True Non-Contact mode, the XE-3DM can realize non-destructive imaging of soft photoresist structures without deforming or damaging them.

Click here for the detailed product information.

News and Events

Park Systems’ 3D-AFM Paper Has Been Selected for the Virtual Journal of Nanoscale Science & Technology

"Three-Dimensional Imaging of Undercut and Sidewall Structures by Atomic Force Microscopy," authored by researchers at Park Systems and published in Review of Scientific Instruments (Volume 82, Number 2), has been selected for the March 7, 2011 issue of Virtual Journal of Nanoscale Science & Technology. The Virtual Journal, which is published by the American Institute of Physics and the American Physical Society in cooperation with numerous other societies and publishers, is an edited compilation of links to articles from participating publishers, covering a focused area of frontier research.

The paper reports the latest progress from Park Systems' technology development in new 3D AFM with high resolution undercut and sidewall imaging capability. In overcoming the limitation of previous 3D AFM approaches by a flared tip, the probes used on the new 3D-AFM maintain the high aspect ratio and sharp tip radius, typically less than 10 nm, providing the accurate metrology of critical dimension along with sidewall roughness for the first time. Combined with non-contact AFM imaging by its patented high bandwidth Z-scanner, Park Systems' XE-3DM technology offers non-destructive characterization of soft sample surface such as photoresist.

Click here for the full news article

Dr. Mineharu Suzuki Appointed as General Manager of Park Systems Japan

Tokyo, Japan, March 28, 2011 – As part of the continuing expansion of its Japanese operation, Park Systems Corp. has appointed Dr. Mineharu Suzuki as General Manager of Park Systems Japan (PSJ). Dr. Suzuki will succeed Shinsuke Sugiura who will remain as a senior advisor to the company. He will be responsible for PSJ’s operation including sales and marketing for all of Park Systems’ Atomic Force Microscope (AFM) products.

Dr. Suzuki commented “Park Systems’ AFMs are enjoying a growing success in Japan due to its excellent product performance and service support. As a result, Park Systems has dramatically improved its reputation as the AFM technology leader and preferred nanotechnology solutions partner over the past several years. Foremostly, I am very excited to work with the young, dedicated, and enthusiastic people at Park Systems.”

Click here for the full news article.


Park Systems Offers Free Maintenance Service to Japanese AFM Users in Response to Recent Earthquake and Tsunami

Tokyo, Japan, April 11, 2011 - Park Systems has decided to provide free maintenance service to its Atomic Force Microscope (AFM) users in Japan, whose XE-series AFM systems were damaged by the recent earthquake and resulting tsunami. The technical support team at Park Systems Japan is checking the status of its AFM users and the need of free maintenance service. The free maintenance service includes a free visit and system evaluation by the members of technical support team of Park Systems Japan. Those who want to receive the free maintenance service can go to www.parkafm.com and contact Park Systems Japan via email or phone.

Click here for the full news article.


Park Systems Japan Will Host the First Japanese Users’ Workshop in Kyoto

Kyoto, Japan, July 08, 2011- Park Systems Japan (PSJ), the AFM technology leader and the preferred nanotechnology solutions partner, will host the first Japanese Users Workshop, to be held at New Miyako Hotel in Kyoto, Japan, on July 8th, 2011.

“It's going to be an informative and fun day spent with Japanese users and the key staff members of Park Systems,” commented Dr. Mineharu Suzuki, General Manager of PSJ. “Park Systems believes in the continued support for our customers. The Users Meeting is a great chance to acknowledge the ground-breaking researches carried out by Park Systems users and an excellent opportunity to learn about them,” he added.

The Japanese Users Meeting is open to all Park Systems users in Japan. It is also open to AFM researchers interested in sharing their research results and learning more about new and latest AFM solutions from Park Systems.

Click here for the full news article.

 
 

 

Upcoming Exhibitions

Semicon West 2011, July 12~14, 2011, San Francisco, USA

Park Systems, the AFM technology leader and the preferred nanotechnology solutions partner, invite you to visit us at SEMICON WEST (Booth #1932), July 12th - 14th, 2011 at the Moscone Center in San Francisco, CA, USA. Park Systems, in its continuing efforts to provide our customers with metrology characterization solutions for today’s challenges in device manufacturing, will be featuring a range of automated AFM products for in-line inspection in wafer manufacturing.  The capabilities of our featured systems range from critical dimension measurement to undercut and sidewall characterization. SEMICON West will provide an excellent opportunity to learn about the XE-Wafer, our automated industrial AFM for in-line wafer inspection and metrology of 200 mm and 300 mm wafers, and the XE-3DM, our new 3D AFM for high resolution 3D metrology with patented tilted Z-scan system.  The XE-3DM is a breakthrough in high resolution imaging of deep undercut structures and sidewalls. In addition, our True Non-Contact ModeTM enables non-destructive measurement of soft photoresist surface with high aspect ratio tips.  Come and discover Park Systems’ fully automated AFM solutions for process monitoring and characterization of critical topographies!

Diskcon Japan 2011, August 02~03, 2011, Tokyo, Japan

You are cordially invited to Diskcon Japan 2011 at the Plaza Industry Ota (PiO) in Tokyo, Japan on August 2nd – 3rd, 2011. Come and visit Park Systems booth and learn more about our industrial product line. Park Systems will be featuring a wide range of automated AFM products, specially engineered for hard disk industry, from automatic defect review to automated PTR measurements and to undercut and sidewall characterization. Learn about the XE-HDM, our automated industrial XE-series AFM, specially designed for hard disk media and substrate applications. With newly developed features designed for user convenience and safety, the XE-HDM combines the superb performance of the XE-series AFM with the high-throughput capability required by hard disk media manufacturers. Also, discover the XE-3DM, Park Systems’ new 3D AFM, utilizing True Non-Contact mode for the non-destructive sidewall roughness measurement of soft photoresist structures. With its unique tilt head capability, the XE-3DM is a breakthrough in high resolution 3D AFM measurements.

Microscopy & Microanalysis 2011 Meeting, August 07~11, 2011, Nashville, USA

Park Systems, the leading nanotechnology solutions partner for the most accurate and reliable AFM results, cordially invites you to visit our booth (# 201) at the Microscopy & Microanalysis 2011 Meeting in Nashville, TN, USA (August 7th -11th ). Please, stop by our booth to learn our wide range of research AFM products. Come and learn about our award-winning XE-100, which provides artifact-free imaging via Crosstalk Elimination (XE) and offers the ultimate in AFM resolution with True Non-Contact mode. Also, find out more about the XE-150, our premier cross-functional AFM with motorized sample stage, and the XE-Bio, our new AFM for live cell imaging with Ion Conductance Microscopy (ICM). All the XE-series of products feature artifact free imaging by Crosstalk Elimination (XE) and non-destructive scan by True Non-Contact mode.

ACS Fall 2011, August 28~September 1, 2011, Denver, USA

Park Systems, the leading nanotechnology solutions partner for the most accurate and reliable AFM results, will exhibit at the ACS Fall Meeting in Denver, Colorado from Aug. 28th to Sep. 1st. Please come and visit us at Booth #1710 to learn our wide range of research AFM products. We will display the all new XE-100 Plus, the Park Systems’ flagship AFM, with a motorized sample stage for Step-and-Scan Automation and improved drift rates.  Also, find out more about the XE-150, our premier cross-functional AFM with motorized sample stage, and the XE-Bio, our new AFM for live cell imaging with Ion Conductance Microscopy (ICM).  All the XE-series of products feature artifact free imaging by Crosstalk Elimination (XE), True Non-Contact mode, and the ultimate in AFM resolution.

Images from Crosstalk Eliminated (XE) AFM

Line Edge Roughness (LER) Measurements by XE-3DM at the Various Heights of a Sidewall

201106-q2-sidewall-profile-afm-crosstalk-eliminated-xe

As each height, one can obtain real sidewall line profile

Click hereto see more images from Crosstalk Eliminated (XE) AFMs

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