- Accurate and Repeatable Surface Roughness Measurement of Media and Substrate
Atomic force microscopy (AFM) is useful for investigating the surfaces and characteristics of different materials down to nanometer detail. Accurate surface roughness measurement is not only a highly powerful technique for understanding the basic physics of materials, but also very useful in examining device structures and their failure mechanisms. In addition, roughness repeatability is one of the very important factors in industrial applications as it relates to the customer's product reliability. Park AFM's True Non-Contact Mode is especially essential for accurate and repeatable surface roughness measurement. In order to measure accurate and repeatable roughness, two key requirements need to be satisfied. First is maintaining the tip sharpness and the other is lowering the system noise. In this paper, we examine these two requirements for measuring surface roughness. Also, we demonstrate why True Non-Contact mode is powerful for accurate roughness measurement by testing a tip-check sample and ultra flat media samples.
Piezoelectric material has been widely used as the actuator of the positioning scanner in an atomic force microscope (AFM) since the invention of the AFM. It has been used not only in the academic instrumentation, but in the commercial AFM products because of its simplicity in structure, and its possibility to move continuously in the nanometer scale. However, it has also been associated with hysteresis and creep errors that prevented conventional AFMs from providing an accurate topography of a sample. Park has developed NX10 featuring a very low noise Z sensor that enables a true topography AFM scanning of a sample.
XE-WAFER: Automated Industrial AFM for In-line Wafer Inspection and Metrology
Park XE-Wafer is a fully automated industrial AFM that can acquire surface roughness, depth, and angle measurements on 200 mm & 300 mm wafers with speed, precision, and value in a production environment. The XE-Wafer offers a non-destructive, in-line imaging tool capable of providing high resolution, direct, and repeatable measurements on multiple locations without damaging the sample. The increased precision and ability to monitor line-width roughness will lead allow process engineers to produce devices with higher performance, at a significantly lower cost than FIB/SEM.
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News and Events
Keibock Lee Joins Park Systems, Inc. as the Company President and General Manager of Park America.
Santa Clara, California, April 20, 2012 - Park Systems, Inc. today announced that Keibock Lee has joined the company as its president and general manager of Park America. Lee, who reports to Park Systems Chairman and CEO Sang-il Park, will lead the company's solid business growth in the Americas market for atomic force microscopy (AFM) and nano metrology products.
Lee is a highly accomplished business executive who brings over 25 years of industry experience starting from software R&D, applications engineering, direct and channel sales, industrial and consumer marketing, general management, and founding of companies. Prior to joining Park, Lee has served in a wide spectrum of industries including pc board and semiconductor test equipments, CAD/CAM peripherals, personal computers, Internet and web services. He was awarded Fairchild Key Technologist while at Fairchild, he has received UK Design Award for the product he had conceived while at Oce (now Canon), and he was the consumer business unit manager for Apple in Japan.
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Please join us for two interactive webinar sessions to learn more about the breaking technologies at Park Systems.
The first session will walk you through the benefits of Park NX10, talk to you about our nano technology solutions for your application needs, and show you a short overview of technology behind Park NX10. The second session will cover the technology of surface roughness measurement by atomic force microscopy (AFM).
Do not miss this ideal opportunity to meet the technical experts from Park who will talk during these webinar sessions. At the end of each session, you will have an opportunity to ask any questions you may have.
Register for a session now by clicking a date below:
Once registered you will receive an email confirming your registration with information you need to join the Webinar.
Dr. Sang-il Park, Founder and CEO of Park Systems, Will Give an Invited Talk at the Industrial Technologies 2012
Aarhus, Denmark, June. 19, 2012- Dr. Sang-il Park, founder and CEO of Park Systems Corporation, will give an invited talk at the Industrial Technologies 2012 in Aarhus, Demark. The talk, entitled "The New Challenges and Needs for Global Cooperation", will examine the policies of Korean government to support and promote global cooperation, using Park as its specific case. Park is a world class scientific instruments corporation that develops and manufactures atomic force microscopy (AFM) and nano metrology products. Beyond the government policies, the audience will have an opportunity to learn more about Park AFM—the latest advancements in AFM technology, including the 3D-AFM for nano-scale metrology and ion conductance microscopy (ICM) for nano-bio applications.
Diskcon Japan 2012, June 05~06, 2012, Tokyo, Japan
You are cordially invited to Diskcon Japan 2012 at the Plaza Industry Ota (PiO) in Tokyo, Japan on June 5th – 6th, 2012. Come and visit Park Systems booth and learn more about our industrial product line. Park will be featuring a wide range of automated AFM products, specially engineered for hard disk industry, from automatic defect review to automated PTR measurements and to undercut and sidewall characterization. Learn about the XE-HDM, our automated industrial XE-series AFM, specially designed for hard disk media and substrate applications. With newly developed features designed for user convenience and safety, the XE-HDM combines the superb performance of the XE-series AFM with the high-throughput capability required by hard disk media manufacturers. Also, discover the XE-3DM, Park's new 3D AFM, utilizing True Non-Contact mode for the non-destructive sidewall roughness measurement of soft photoresist structures. With its unique tilt head capability, the XE-3DM is a breakthrough in high resolution 3D AFM measurements.
ICN+T 2012, July 23~27, 2012, Paris , France - (Booth #GHL6)
Microscopy & Microanalysis 2012, July 29~ Aug. 02, 2012, Phoenix, USA - (Booth #617)
ACS Fall 2012, Aug. 19~23, 2012 Philadelphia, USA - (Booth #504)
Park Research Interview Series
1. Interview with Professor David Harper, University of Tennessee (Park XE-100 user since 2006)
"Park SThM mode was a suitable method to study the adhesive polymer interactions in wood cells. The thermal properties found across the cell walls while in contact with PRF adhesive shows the ability of its penetration, which was not found in cells with PUR adhesive or embedded in epoxy. As a result, Park AFM has shown to be a useful method to study thermal properties at the micro-scale with high accuracy as seen from the work presented here."
"I like XE-70 AFM because it's very user friendly. It's easy to operate, and the operation is quite intuitive. For instance, the approaching process with Park AFM is very straight forward and intuitive. A new student without any prior experience can learn to use it, and generate sample measurements within a week."
Sample Topography Measured by Low Noise Z Detector
Z detector noise is low enough to replace the applied voltage to the Z scanner as the Topography signal. The Z detector signal provides correct scanner positions during high speed scans, resulting in True Sample TopographyTM free of piezo creep.
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