Welcome to Park Systems’ Q3 Newsletter
Time-resolved Photocurrent Mapping: Time-domained Exciton Generation of Photovoltaic Materials
Building upon the strength of its state-of-the-art conductive AFM, Park Systems has developed a ground-breaking capability of Time-Resolved Photocurrent Mapping (Tr-PCM). The mapping mode measures the temporal response of photo-sensitive materials to time-resolved illumination without any interference from unwanted light source including AFM’s feedback laser. Click here for more information
XE HDM: Automatic Defect Review AFM for Media and Substrates
The XE-HDM is an automated defect review AFM which revolutionizes the way defects in HDD substrates and media are searched, scanned and analyzed. The new XE-HDM significantly increases throughput for the defect review process; the test runs with real defects demonstrate over 500-800% gain in throughput when compared with other methods of defect review. Click here for the detailed product information.
News and Events
Park Systems’ CEO Will Give an Invited Talk at Diskcon USA 2009
Dr. Sang-il Park, CEO and Chairman of Park Systems, will give an invited talk entitled “Dimensional Inline Metrology with the Crosstalk Eliminated (XE) Atomic Force Microscopy” at Diskcon USA 2009. The talk focuses on the advantages of using non-contact AFM instead of tapping mode AFM in slider, media, and wafer fab manufacturing. Click here for the abstract of Dr. Park’s talk.
Park Systems Workshop at ACS Fall 2009
Park Systems hosted a workshop in ACS Fall 2009 which took place in Washington DC, USA on August 18th, 2009. Director of global sales and marketing, Dr. Ryan Yoo, gave a presentation about the newly developed Time Resolved Photocurrent Mapping. Dr. Ying Xiong from Park Systems US also gave a presentation on “Enhanced EFM Application & Piezo Force Microscopy”, respectively.
Park Systems exhibiting at the JAIMA Show 2009 (Booth 5A-002), September 2nd ~ 4th, Makuhari Messe, Japan
We expect the exhibition to serve as a wonderful opportunity for attendees to learn more about Park Systems’ research product line.
Park Systems exhibiting at the SPIE Photomask Technology 2009 (Booth 310), September 14th ~ 18th, Monterey, USA
There will be a presentation by our applied scientist, Yueming Hua, from US office entitled “New AFM solutions for photomask metrology” on September 16th. The presentation will highlight how Park Systems’ AFM is able to play a more important role in Critical Dimension (CD) and photomask industry with the unique Crosstalk Elimination (XE) technology.
Park Systems exhibiting at the Diskcon USA 2009 (Booth No.311), September 23rd ~ 24th, Santa Clara, USA
Dr Sang-il Park, CEO and Chairman of Park Systems, will give an invited talk, entitled “Dimensional Inline Metrology with the Crosstalk Eliminated (XE) Atomic Force Microscopy”.
Park Systems exhibiting at the Neuroscience 2009 (booth No.443), October 17th ~ 21st, Chicago, USA
Please visit us and learn more about about XE-Bio, our latest product solution for life science research.
Images from Crosstalk Eliminated (XE) AFM
Temperature-dependent magnetic domain change in 50-nm-thick MnAs/GaAs(001)
Magnetic Force Microscopy (MFM) shows the surface domain distribution of magnetic materials. MnAs film deposited on GaAs(001) substrate is observed by MFM while varying the temperature. As the temperature decreases, the small localized domains are formed and gradually collapsed to the stripe domains, and finally at 17.5 °C the whole film becomes a nearly single magnetic domain leaving only a small fraction of the β-MnAs phase. The scan area is 4 μm × 4 μm.