Welcome to Park Systems’ Q4, 2010 Newsletter
The XE-150 is the premier Cross-Functional AFM with motorized sample stage. The XE-150 is the most feasible and practical way to scan large samples with ultimate AFM resolution and reliability in AFM industry. The XY motorized sample stage is optimized for both small and large sample placement, 150 mm × 150 mm or 200 mm x 200 mm, and allows full travel over the entire sample. Also, the Step-and-Scan automated sample measurement greatly minimizes user’s required presence during system operation while maintaining the ultimate AFM/SPM performance in True Non-Contact nanoscale metrology. It is mainly used as a non-destructive metrology tool for materials science, polymers, electrochemistry and other applications in nanoscience and engineering. It can adopt a wide range of optical couplings with its open side access. Recently, a 400 µm x 400 µm scanner with superb flatness and linearity was developed to enable a larger sized imaging and sample manipulation.
Click here for the detailed product information.
Dr. Sang-il Park, Founder and CEO of Park Systems, Will Present an Invited Talk at the MRS Fall 2010
Boston, USA, Nov 30, 2010 - Dr. Sang-il Park, CEO and Chairman of Park Systems, will give an invited talk at the MRS Fall 2010, entitled “The Crosstalk Eliminated (XE) Atomic Force Microscope and Advanced Nanotechnology Applications (Symposium VV 5.3, 2:15 PM, Nov. 30, 2010) ". His presentation will cover the one of the latest advancements in AFM industry which has been the Crosstalk Elimination in the XY scan where the XY flexure scanner is decoupled from the Z scanner to which a probe is attached. The design concept of the XE Technology is utilized to support specific advanced nanotechnology applications: such as under-cut measurement by intentionally changing the angle of the Z scanner thereby enabling sidewall roughness characterization in the nanoscale for the first time. Conference attendees will be able to learn XE Technology with decoupled XY and Z scanners and True Non-Contact Mode which provides unprecedented accuracy and reliability in nanoscale measurement.
Click here for the rest of the news article.
Jeddah, Saudi Arabia, Nov 15, 2010 – Park Systems is pleased to announce K.I.Abdulkadir & Partners Co. (KIAK) of Jeddah, Saudi Arabia as the distributor of Park Systems’ complete line of AFMs in the Middle East region. After an extensive search, KIAK is chosen for the greatest breadth of its experience in scientific instrument industry and the best customer support. “This association of Park Systems with K.I.Abdulkadir & Partners will provide customers with the best quality products and service in the Middle-East industry”, announced Jessica Kang, the Senior Sales Manager of Park Systems. For over 25 years, KIAK has worked to develop its reputation with its customers, an effort that has made it the preferred supplier of material testing products in the Middle East. KIAK will sell, install, and support Park Systems’ full line of AFMs, including the XE-Bio, the new bio AFM for live cell imaging with Ion Conductance Microscopy (ICM), and the XE-100, the award-winning research-grade AFM with Step-and-Scan Automation.
Click here for the rest of the news article.
MRS Fall Meeting 2010, November 30~December 02, 2010, Boston, USA
Park Systems, the AFM technology leader and preferred nanotechnology solutions partner, will exhibit at the MRS Fall 2010 in Boston, Massachusetts from Nov. 30th to Dec. 2nd. Please come and visit us at Booth 410 to learn our wide range of research AFM products. We will display the all new XE-100 Plus, the Park Systems’ flagship AFM, with a motorized sample stage for Step-and-Scan Automation and improved drift rates. Also, find out more about the XE-150, our premier cross-functional AFM with motorized sample stage, and the XE-Bio, our new AFM for live cell imaging with Ion Conductance Microscopy (ICM). All the XE-series of products feature artifact free imaging by Crosstalk Elimination (XE), True Non-Contact mode, and the ultimate in AFM resolution.
Park Systems, the AFM technology leader and preferred industrial nanotechnology solutions partner, would like to invite you to visit us at SemiconJapan 2010(Booth# 3A-201), December 1st ~ 3rd , 2010 at the Makuhari Messe in Chiba, Japan. Park Systems, in its continuing efforts to provide our customers with nanometrologysolutions for today’s challenges in device manufacturing, will be featuring a range of automated AFM products for in-line fab. Theexhibition will provide an excellent opportunity to learn about the XE-Wafer, our automated industrial AFM for in-line wafer inspection and metrology of 200 mm and 300 mm wafers, and the XE-3DM, our new 3D AFM for high resolution 3D metrology with patented tilted Z-scan system. The XE-3DM is a breakthrough in high resolution imaging of deep undercut structures and sidewalls. In addition, our True Non-Contact Mode enables non-destructive measurement of soft photoresist surface with high aspect ratio tips. Come and discover Park Systems’ fully automated AFM solutions for process monitoring and characterization of critical topographies!
Park Systems sincerely invite you to visit our booth (#319) during the American Society of Cell Biology Annual Meeting (ASCB) to be held in Philadelphia, USA, December 11th ~15th, 2010. As the premier international meeting in the field of cell biology, the ASCB Annual Meeting will include over 100 scientific sessions and 3,500 poster presentations to cover a variety of scientific areas within the discipline. Park Systems’ representatives will demonstrate the XE-Bio, the new bio AFM for live cell imaging, a powerful 3-in-1 microscope that combines industry’s only True Non-Contact AFM, Ion Conductance Microscope (ICM), and inverted optical microscope into one instrument. See the latest innovation in live cell imaging and learn about non-invasive, high resolution, in-liquid imaging technique for live cells. More information about the XE-Bio will be available at Park Systems’ booth.
The image is the optical view, 1080 µm x 760 µm, of one million pattern array on a gold/chrome-coated silicon substrate. The repeating pattern was generated by using an array of polymer pens inked with 16-mercaptohexadecanoic acid (MHA).
Click hereto see more images from Crosstalk Eliminated (XE) AFMs