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Welcome to Park Q1, 2013 Newsletter facebooktweeter  
Featured Application Featured Product News and Events  Upcoming Exhibitions  

Featured Application

High Sensitivity, High Throughput Dopant Profiling


Figure 1. An n-doped silicon sample with areas of varying dopant concentration was imaged using scanning capacitance microscopy (SCM) mode of Park NX Series AFM. Park's, re-designed, highly sensitive SCM can easily resolve small differences in the doping ratio with a high signal-to-noise ratio. In the sample above, the doping concentration of less than an order of magnitude is clearly and easily distinguishable. The histogram to the right shows each discrete region.

In semiconductor manufacturing, the ability to characterize the dopant profile is important in identifying causes of failure as well as in making design advancements. For device characterization, scanning capacitance microscopy (SCM) provides the unique ability to measure quantitative 2D dopant profiles. However, up until prior to the introduction of Park NX series AFM, the signal-to-noise level of the technique has been insufficient to distinguish small structures when the doping concentration difference was less than an order of magnitude. 

By employing a proprietary capacitance detector design and fast scan methodology, Park has succeeded in increasing SCM sensitivity and throughput in its Park NX Series AFM. Even when using low AC bias voltages, Park's newly designed SCM detector suppresses detector noise level to maintain a high signal-to-noise ratio. In addition, with the implementation of Step Wise Scan, the throughput of the SCM measurement can be increased, as much as ten times the standard SCM scan speeds, without compromising signal sensitivity, spatial resolution or data accuracy. 

Featured Product


Park NX20

Park NX20 is the most accurate AFM for failure analysis (FA) and quality assurance (QA), is the only high-end, large-sample AFM with non-contact mode for preserving tip sharpness. Park NX20 provides the highest accuracy and repeatability for roughness measurements and defect review. Park NX20 offers the highest productivity and the industry's lowest AFM lifecycle costs by dramatically lowering tip costs by extending tip lifetime. The result is a total AFM solution for FA and QA that meets accuracy, productivity and budgetary needs.

Click here for the detailed product information.


News and Events

Park AFM Webinar

Please join us for two interactive Park AFM webinar sessions to learn more about the latest AFM technologies at Park.

The webinar will cover two topics as below   
Part 1. NX20: The Most Accurate AFM for Failure Analysis (FA) & Quality Assurance (QA)
Part 2. Live Single Cell Imaging with Park Scanning Ion Conductance Microscopy (Park SICM)

The first session will walk you through the next generation AFM advances in Park NX20, talk to you about our Park nano technology solution to your application needs. The second session will cover the technology of single live cell imaging with Park scanning ion conductance microscopy (Park SICM). 

Do not miss these great opportunities to meet the technical experts from Park during the webinar session. At the end of the presentation, you will have an opportunity to ask questions you may have specific to your application needs.

Register now for a session by clicking on the date you wish to attend:

Wednesday, March 20 Wednesday, March 20
China 1:00 PM - 1:30 PM (CST)* Asia 11:30 AM - 12:30 PM (IST)
Americas 4:00 PM - 5:00 PM (EDT)* Japan 4:00 PM - 4:30 PM (JST)*
  Europe 1:00 PM - 2:00 PM (GMT)
* China and Japan: Part 1. Park NX20 session will be presented only.

Upon your registration, you will receive a confirmation email with the login details.

Park True Sample TopographyTM Provides the Most Accurate AFM Topography Without Piezo Creep Error

Santa Clara, California, October 26, 2012 - Park Systems announces True Sample TopographyTM describing Park technology that eliminates piezoelectric creep errors, resulting in the extremely accurate profile of a sample surface. True Sample TopographyTMfeatures an industry-leading Z-detector with a noise level low enough to use it for the AFM topography signal. 

With True Sample TopographyTM Park AFM overcomes the Z-scanner errors with its industry-leading low-noise (0.2 angstrom) Z-position detector. This detector is so accurate that it provides the topography signal for the closed-loop system. It enables extremely accurate height (topography) recording of sample surface features even during high-speed scanning. 

Dr. Sang-il Park, the founder and CEO of Park System notes, "Piezo creep is caused by the intrinsic materials property of a piezoelectric actuator that drives the Z scanner. The only way to correct this artifact is to use an independent position sensor that directly measures the topography. In True Sample TopographyTM , piezo creep error is corrected by independent position sensors, and their noise level is low enough to be a topography signal."

Clcik here for the full news article.

Park Dual Servo System Provides the Most Accurate and Orthogonal AFM Scan 

Santa Clara, California, USA, December 3, 2012 - Park Systems announces today the release of a closed-loop XY scanner with a Dual Servo system. This innovation loosely decouples the X and Y scanners to eliminate crosstalk and adds a symmetrical, low-noise position sensor on each axis to produce the most accurate and orthogonal (independent) atomic force microscopy in the industry.  

Dr. Sang-il Park, the founder and CEO of Park Systems describes the new system this way, "In its Crosstalk Elimination technology, Park AFM utilizes two independent flexure scanners, one for the sample and one for the probe. This introduces a highly beneficial decoupling of the XY and Z movements in an AFM scan. Now, with Duo Servo technology, the flexure XY scanner separates the X and Y scan motion while retaining a small coupling between their movements to accommodate accurate scans as the sample gets bigger and the scan area increases. In the Dual Servo system, a symmetrical, low-noise position sensor, incorporated on each axis of the XY scanner, corrects and compensates for non-linear and non-planar positional errors."

Click here for the full news article.

Park XE7 - Affordable, Research-Grade AFM with Flexible Sample Handling 

Santa Clara, California, February 22, 2013 - Park Systems introduces Park XE7, an affordable, research-grade AFM with flexible sample handling. It facilitates AFM researchers with a limited budget while not sacrificing any of the innovative Park AFM technology that sets this product line apart from conventional AFMs.

"We continually develop and deploy innovative technologies to achieve high accuracy in AFM imaging and measurements," said Dr. Sang-Il Park, the founder and CEO. "Park XE7 will allow a wider range of researchers to have the most accurate nanoscale results at a price within their budget."

Click here for the full news article.

Upcoming Exhibitions

2013 APS Spring Meeting, March 18~22, 2013, Baltimore, USA 
2013 MRS Spring Meeting, April 1~5, 2013, San Francisco, USA
2013 ACS Spring Meeting, April 7~11,2013, New Orleans, USA 
2013 E-MRS Spring Meeting, May 28~30, 2013, Strasbourg, France 

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