High Throughput, Automatic Defect Review
The task of identifying nanoscale defects is a very time consuming process for engineers working with media and flat substrates. Park NX-HDM is an atomic force microscopy system that speeds up the defect review process by an order of magnitude through automated defect identification, scanning and analysis. Park NX-HDM links directly with a wide range of optical inspection tools, thus significantly increasing the automatic defect review throughput.
Sub-Angstrom, Surface Roughness Measurement
Increasingly, industries require ultra-flat media and substrate to address the ever-shrinking device dimensions. Park NX-HDM provides accurate sub-angstrom surface roughness measurements, scan after scan. Park NX-HDM, together with its industry’s lowest noise floor, and its unique True Non-ContactTM technology, it is the most accurate AFM for surface roughness measurement in the market.
FA & QA Solutions for HDD Industry
The leading nano metrology tool for failure analysis and large sample research
Automated AFM Solutions for HDD Industry
Park Systems provides highly reliable solutions for development and production monitoring of disk media and substrates, sliders, and PMR recording heads.
Park HDM Series
Automatic Defect Review and Sub-Angstrom Surface Roughness Measurement for Media and Substrates
Automatic Pole Tip Recession measurements on rowbars and sliders
Wafer-based inspection of surface roughness, heights, and angle measurements
Undercut characterization of overhang and high resolution sidewall imaging