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XE Automation
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Atomic Force Microscopy
(AFM) is emerging as an essential tool for nanoscale analysis
and measurement in many industries. With its ability to
accurately measure critical dimensions in the micrometer
to nanometer regime, the AFM is becoming the tool of choice
for applications involving surface roughness, trench depth,
sidewall slope angle, and line width characterization of
various samples features and materials. Now the major industries
have adopted the AFM as a tool for critical manufacturing
process monitoring. The semiconductor industry, in particular,
approves the AFM as being the next generation precision
metrology tool, according to National Technology Roadmap
published by United States Semiconductor Industry Association
(SIA).
Park Systems produces fully-automated Atomic Force Microscopy
systems designed for process monitoring and characterization
of critical topographies such as step heights, surface roughness,
overhang and trench profiles, sidewall roughness, and critical
angle measurements.
Using an ultra sharp tip, that maintains its shape by a
True Non-Contact imaging mode, the Park Systems XE-series
AFM’s create high resolution reconstruction of surfaces
and three dimensional structures. |
XE Inline Automation
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Tilt Adjustment
- Automated Reference Marker Detection
- Automatic Stage Mapping
- Automatic XY Stage Coordinate Navigation
- Automatic Measurement Location Detection
- Automatic Pattern Recognition
- Automatic Measurement Control
- Automatic Data Analysis
- Automatic Data Export
- Automatic Tip Exchange
- Automatic Wafer Handling |
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Park Systems’ main industrial products function as
fully automated systems that find optimal feedback
parameters and scanning speeds for a
given sample size and surface. They are equipped with
the logical and customizable Windows XP-based user
interface, easy recipe writing for
automatic operation, pattern recognition based on
high resolution direct on-axis optics, and unique
automatic tip exchange.
Park Systems’ innovative vision system and pattern
recognition algorithms enable fully automatic operation
of AFM measurements so that you
can focus on critical process issues. The advanced
navigation system with coordinate translation automatically
locates the areas of interest,
navigates to the desired measurement point by pattern
recognition (with COGNEX vision provided), and performs
a measurement.
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XEA |
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Systems’ XEA is the inline automation control
software that carries out the AFM measurement
of a sample following the preset procedure
written in a recipe file for data acquisition,
analysis, and export. Supporting auto, semi-auto,
and manual modes, XEA allows you to perform
various system-wide functions such as editing
a measurement method for each step of an automated
measurement procedure, loading a recipe file,
commencing automated measurements, monitoring
a measurement process, and obtaining measurement
data. |
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