Accurate Nanoscale Measurement


Technological innovation in the hard disk drive and semiconductor industries requires critical nanoscale and smaller measurements in the lab and manufacturing lines. However, traditional metrology methods aren't keeping pace with this rapid innovation and are not capable of accurate nanoscale imaging and measurements. To address this extreme miniaturization in leading-edge designs, a new era in industrial use of atomic force microscopes (AFM) has begun.

Park Systems is leading the way in this new era of AFMs for industrial nanoscale metrology. Our original and innovative AFM solutions have enabled the use of atomic force microscopes in nanoscale device development and production quality control in the hard disk drive and semiconductor industries.


Fully Automated AFM for In-Fab Metrology

- Feature Identification by Pattern Recognition
- Automatic XY Stage Coordinate Navigation
- Automatic Measurement Control
- Automatic Data Analysis & Export
- Automatic Wafer Handling up to 300 mm
- Automatic Tip Exchange
- Class 1 Cleanroom Micro-Environment
- Compatible with SEC II, GEM, and SMIF


Park Systems offers fully-automated Atomic Force Microscopy systems designed for process monitoring and characterization of critical topographies such as step heights, surface roughness, overhang and trench profiles, sidewall roughness, and critical angle measurements. Using an ultra-sharp tip that maintains its shape via True Non-Contact imaging mode, the Park Systems XE-series AFMs create a high-resolution reconstruction of surfaces and three dimensional structures.


XEA

Park Systems¡¯ XEA is the inline automation control software that carries out the AFM measurement of a sample following the preset procedure written in a recipe file for data acquisition, analysis, and export. Supporting auto, semi-auto, and manual modes, XEA allows you to perform various system-wide functions such as editing a measurement method for each step of an automated measurement procedure, loading a recipe file, commencing automated measurements, monitoring a measurement process, and obtaining measurement data.


PARK SYSTEMS RELIABILITY

Correlation

Thanks to its revolutionary platform designed for industrial metrology, the XE-AFM will correlate with any existing Park industrial AFMs that have been previously used for manufacturing, inspection, analysis, or research.

System Uptime

Our engineers and scientists adopted the most rigorous industry standard of product development to ensure the highest level of system reliability. Our AFM solutions can be seamlessly incorporated as either an inline or offline inspection tool with minimal maintenance requirements.

Service & Maintenance

Park Systems is committed to the highest level of service and support, and every effort is made to understand our industrial customers¡¯ needs. We place the utmost importance on meeting promised delivery dates, guaranteed quality, and faithful after-sales service.





Atomic Force Microscope
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