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Accurate Nanoscale Measurement
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Technological innovation in the hard disk drive and semiconductor industries requires critical nanoscale and smaller measurements in the lab and manufacturing lines. However, traditional metrology methods aren't keeping pace with this rapid innovation and are not capable of accurate nanoscale imaging and measurements. To address this extreme miniaturization in leading-edge designs, a new era in industrial use of atomic force microscopes (AFM) has begun.
Park Systems is leading the way in this new era of AFMs for industrial nanoscale metrology. Our original and innovative AFM solutions have enabled the use of atomic force microscopes in nanoscale device development and production quality control in the
hard disk drive and
semiconductor industries.
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Fully Automated
AFM for In-Fab Metrology |
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| - Feature Identification
by Pattern Recognition
- Automatic XY Stage Coordinate Navigation
- Automatic Measurement Control
- Automatic Data Analysis & Export
- Automatic Wafer Handling up to 300 mm
- Automatic Tip Exchange
- Class 1 Cleanroom Micro-Environment
- Compatible with SEC II, GEM, and SMIF |
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Park Systems offers fully-automated Atomic Force Microscopy
systems designed for process monitoring and characterization
of critical topographies such as step heights, surface
roughness, overhang and trench profiles, sidewall
roughness, and critical angle measurements. Using
an ultra-sharp tip that maintains its shape via True
Non-Contact imaging mode, the Park Systems XE-series
AFMs create a high-resolution reconstruction of surfaces
and three dimensional structures.
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| Park Systems¡¯ XEA
is the inline automation control software
that carries out the AFM measurement of a
sample following the preset procedure written
in a recipe file for data acquisition, analysis,
and export. Supporting auto,
semi-auto, and manual modes, XEA allows you
to perform various system-wide functions such
as editing a measurement method for each step
of an automated measurement procedure, loading
a recipe file, commencing automated measurements,
monitoring a measurement process, and obtaining
measurement data. |
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| Correlation
Thanks to its revolutionary platform designed for
industrial metrology, the XE-AFM will correlate with
any existing Park industrial AFMs that have been previously
used for manufacturing, inspection, analysis, or research.
System Uptime
Our engineers and scientists adopted the most rigorous
industry standard of product development to ensure
the highest level of system reliability. Our AFM solutions
can be seamlessly incorporated as either an inline
or offline inspection tool with minimal maintenance
requirements.
Service & Maintenance
Park Systems is committed to the highest level of
service and support, and every effort is made to understand
our industrial customers¡¯ needs. We place the utmost
importance on meeting promised delivery dates, guaranteed
quality, and faithful after-sales service.
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