Accuracy Like Never Before

Shrinking form factors are driving the need to design at the nanoscale level in the hard disk drive. Traditional metrology tools have lacked the accuracy needed for nanoscale design and manufacturing. Park Systems has met this challenge in industrial metrology with enabling breakthroughs.

- Crosstalk Elimination (XE) enables artifact-free and non-destructive imaging
- New 3D AFM enables high resolution imaging of sidewall or undercut features

AFMs that have enabled nanoscale design have traditionally not been fast enough for use in production quality control. All that has changed with Park Systems revolutionary gains in throughput enabling AFMs for use in automatic in-line manufacturing.

These include 500-800% gain in throughput for defect review of media and substrates , where automated defect identification with raw data and partnership process enables successful defect analysis, and programmable data density for high-throughput feature measurement, where we enable much faster measurement of the tiny writer pole on individual HDD sliders by selectively focusing on critical areas with high-resolution imaging.

Cost-Effectiveness Like Never Before

Accuracy and throughput in nanometrology must be delivered in a cost-effective solution to move successfully from research to inline manufacturing. Park Systems have met this cost challenge with industrial AFM solutions that address the need for complete automation, faster imaging, and longer tip life.

We cut costs by replacing spatially limited optical profilers with high resolution imaging and fully automated AFM, and by replacing slower and expensive SEM with efficient, automatic, and affordable 3D AFM for industrial in-line manufacturing.

Also, we significantly lower the cost of ownership with at least 200% longer AFM tip life. The tapping forces of conventional AFMs cause faster tip wear, but our True Non-Contact Mode^TM AFMs maintain tip quality resulting in the lower total cost of ownership.